Abstract:
A review. The following topics are discussed: Patterning by the Direct and Feedback modes of the SECM (Semiconductor, metal, and inorg. material etching and deposition; deposition of conducting polymers; self-assembled monolayers, polymers, and biomol. patterning); Speed of patterning, resoln., and scope of materials and approaches. [on SciFinder(R)]Notes:
CAPLUS AN 2013:1282783(Conference; General Review)